Anove LogoAnove LogoExplAIn
AI frontrunners
Back to Directory

Factris FAB AI Features

by Factris

AI Application
Low Confidence

Factris's FAB (Finance Automation for Business) platform includes two named AI features: AI-powered risk management, which analyzes SME and buyer data to detect fraud, late-payment risk, and credit issues in real time; and the AI-enhanced Robot OCR Tool, which uses optical character recognition to extract text from invoice images/documents, eliminating manual data entry during invoice processing.

Visit Website

Transparency Score

Weighted across four pillars · updated September 7, 2026

Overall grade
20% weighted
ABCDF
Model
—
Not yet assessed
Infrastructure
—
Not yet assessed

Capabilities

Ai Fraud And Credit Risk Detection
Automated Invoice Ocr
Buyer Monitoring
Risk Assessment

Vendor Information

Complete information about the vendor/provider of this AI application

FactrisView all products →
Factris Holding B.V.(Trading as: Factris)
Contact Information
www.factris.com/en/
+31 20 50 50 333
Registered Address
Arlandaweg 92, Amsterdam, 1043 EX, NL

EU AI Act Provider Information

Verification Status:
Unverified
(Last verified: September 4, 2026)
Factris Holding B.V.(Trading as: Factris)
Arlandaweg 92, Amsterdam, 1043 EX, NL
+31 20 50 50 333
Compliance & Risk

Get insights into risk by running assessments on this AI application.

Work at Factris? Claim this listing to correct or complete the data.

Added: September 7, 2026
Updated: September 7, 2026

Ready to manage AI applications?

Track, assess, and govern your AI applications with Anove.

Anove LogoAnove LogoAnove International B.V.

Helping organizations discover and manage AI applications responsibly. Your trusted source for AI governance and compliance.

Quick Links

  • Browse Directory
  • FAQ
  • Sign In

Resources

  • Documentation
  • Status
  • Anove.ai

Terms

  • Privacy Policy
  • Terms & Conditions
  • Responsible Disclosure
  • AI Legal Notice
  • Security Policy

© 2026 Anove International B.V. All rights reserved.